Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor-Reference-Cited by-同舟云学术

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Spatial atomic layer deposition on flexible substrates using a modular rotating cylinder reactor

Published:2015-01 Issue:1 Volume:33 Page:01A132
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sharma Kashish,Hall Robert A.,George Steven M.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4902086

Cited by 41 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mechatronic Spatial Atomic Layer Deposition for Closed‐Loop and Customizable Process Control;Advanced Materials Technologies;2024-03-08

2. Building Semipermeable Films One Monomer at a Time: Structural Advantages via Molecular Layer Deposition vs Interfacial Polymerization;Chemistry of Materials;2024-01-18

3. Assessing the Environmental Impact of Atomic Layer Deposition (ALD) Processes and Pathways to Lower It;ACS Materials Au;2023-04-27

4. Multiscale CFD Modeling of Area-Selective Atomic Layer Deposition: Application to Reactor Design and Operating Condition Calculation;Coatings;2023-03-05

5. Chemical synthesis of complex oxide thin films and freestanding membranes;Chemical Communications;2023

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