Mechanisms of excimer laser cleaning of air‐exposed Si(100) surfaces studied by Auger electron spectroscopy, electron energy‐loss spectroscopy, reflection high‐energy electron diffraction, and secondary‐ion mass spectrometry-Reference-Cited by-同舟云学术

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Mechanisms of excimer laser cleaning of air‐exposed Si(100) surfaces studied by Auger electron spectroscopy, electron energy‐loss spectroscopy, reflection high‐energy electron diffraction, and secondary‐ion mass spectrometry

Published:1991-03 Issue:2 Volume:9 Page:223-227
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Tsu R.,Lubben D.,Bramblett T. R.,Greene J. E.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577525

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Time-resolved imaging of microscale dynamics in laser drying of silicon wafers;Applied Surface Science;2024-02

2. In situ removal of a native oxide layer from an amorphous silicon surface with a UV laser for subsequent layer growth;CrystEngComm;2018

3. Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment;Journal of Visualized Experiments;2015-11-09

4. Selective areain situconversion of Si (0 0 1) hydrophobic to hydrophilic surface by excimer laser irradiation in hydrogen peroxide;Journal of Physics D: Applied Physics;2014-08-28

5. Excimer laser-assisted chemical process for formation of hydrophobic surface of Si (001);Applied Physics A;2014-03-23

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