Mechanism of ArF resist-pattern shrinkage in critical-dimension scanning electron microscopy measurement-Reference-Cited by-同舟云学术

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Mechanism of ArF resist-pattern shrinkage in critical-dimension scanning electron microscopy measurement

Published:2004 Issue:1 Volume:22 Page:226
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Azuma Tsukasa,Chiba Kenji,Abe Hideaki,Motoki Hiroshi,Sasaki Noriaki

Publisher

American Vacuum Society

Subject

General Engineering

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