Reactive sputter deposition of WO3 films by using two deposition methods-Reference-Cited by-同舟云学术

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Reactive sputter deposition of WO3 films by using two deposition methods

Published:2019-05 Issue:3 Volume:37 Page:031514
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Yasuda Yoji¹,Hoshi Yoichi¹,Kobayashi Shin-ichi¹,Uchida Takayuki¹,Sawada Yutaka¹,Wang Meihan²,Lei Hao³

Affiliation:

1. Tokyo Polytechnic University, 1853 Iiyama, Atsugi, Kanagawa 243-0297, Japan

2. School of Mechanical Engineering, Shenyang University, Shenyang 110044, China

3. Surface Engineering of Materials Division, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5092863

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The measurement and impact of negative oxygen ions during reactive sputter deposition;Critical Reviews in Solid State and Materials Sciences;2023-09-21

2. Coloring and Bleaching Properties of 500–1000 nm‐Thick Electrochromic Tungsten Oxide Films Deposited by Reactive Direct Current Magnetron Sputtering;physica status solidi (a);2021-12-23

3. Top-emission organic light emitting diode with indium tin oxide top-electrode films deposited by a low-damage facing-target type sputtering method;Thin Solid Films;2020-03

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