Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
Author:
Affiliation:
1. Laboratoire de Physique des Gaz et des Plasmas—LPGP, UMR 8578, CNRS—Université Paris-Sud, 91405 Orsay, France
2. Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic
Funder
Czech Science Foundation
European Commission (EC)
Centre National de la Recherche Scientifique (CNRS)
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.4953033
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