Effect of silicon substrate microroughness on gate oxide quality-Reference-Cited by-同舟云学术

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Effect of silicon substrate microroughness on gate oxide quality

Published:1996-09 Issue:5 Volume:14 Page:3299
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Hegde Rama I.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication and Characterization of CuInGaSe Thin Films Deposited on Silicon and Quartz Substrates Using One-Step Sputtering;Silicon;2023-11-13

2. Modifications of Textured Silicon Surface Morphology and Its Effect on Poly-Si/SiO x Contact Passivation for Silicon Solar Cells;IEEE Journal of Photovoltaics;2019-11

3. Effect of Crystallographic Orientation and Nanoscale Surface Morphology on Poly-Si/SiOx Contacts for Silicon Solar Cells;ACS Applied Materials & Interfaces;2019-10-15

4. Overview of Wafer Contamination and Defectivity;Handbook of Silicon Wafer Cleaning Technology;2018

5. Quantification of roughness and spatial distribution of dislocations in MBE and MOVPE grown LED heterostructures;Materials Science in Semiconductor Processing;2016-11

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