Mechanical properties and pattern collapse of chemically amplified photoresists-Reference-Cited by-同舟云学术

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Mechanical properties and pattern collapse of chemically amplified photoresists

Published:2000 Issue:6 Volume:18 Page:3450
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Que Long,Gianchandani Yogesh B.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A MEMS nanoindenter with an integrated AFM cantilever gripper for nanomechanical characterization of compliant materials;Nanotechnology;2020-05-14

2. Physical Patterning Performance in the Modified Layer Extraction Rule with an Image Sensor Device;Journal of Nanoscience and Nanotechnology;2017-10-01

3. Effect of Double Epitaxial Layer on the Latch-Up Immunity in High-Power Devices;Science of Advanced Materials;2017-04-01

4. Identification and Elimination of Hygro-Thermo- Mechanical Stress-Effects in a High-Precision MEMS Pressure Sensor;Journal of Microelectromechanical Systems;2017-04

5. Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography;Microelectronic Engineering;2016-10

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