Impact of plasma processing on integrated circuit technology migration: From 1 μm to 100 nm and beyond-Reference-Cited by-同舟云学术

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Impact of plasma processing on integrated circuit technology migration: From 1 μm to 100 nm and beyond

Published:2003-09 Issue:5 Volume:21 Page:S131-S138
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Tachi Shinichi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1601611

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