Shot noise models for sequential processes and the role of lateral mixing-Reference-Cited by-同舟云学术

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Shot noise models for sequential processes and the role of lateral mixing

Published:2006 Issue:4 Volume:24 Page:1902
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Neureuther A. R.,Pease R. F. W.,Yuan L.,Baghbani Parizi K.,Esfandyarpour H.,Poppe W. J.,Liddle J. A.,Anderson E. H.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of secondary electron emission noise in SEM;Microscopy;2019-03-07

2. Relative importance of various stochastic terms and EUV patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-10-04

3. Research Update: Electron beam-based metrology after CMOS;APL Materials;2018-07

4. Theoretical study on effects of exposure pattern width on line edge roughness and stochastic defect generation in fabrication of 16-nm-half-pitch line-and-space patterns by electron beam lithography;Japanese Journal of Applied Physics;2017-10-12

5. Simulation of shotnoise induced side-wall roughness in electron lithography;SPIE Proceedings;2016-03-08

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