Electrical and microstructural properties of N+ ion-implanted ZnO and ZnO:Ag thin films-Reference-Cited by-同舟云学术

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Electrical and microstructural properties of N+ ion-implanted ZnO and ZnO:Ag thin films

Published:2011-05 Issue:3 Volume:29 Page:03A108
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Myers Michelle A.,Myers Michael T.,Tsai Chen-Fong,Lee Joon Hwan,Lu Tianlin,Shao Lin,Wang Haiyan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3554836

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of implantation regimes of silver ions on the structure and optical properties of zinc-oxide nanocrystalline films;Technical Physics;2016-08

2. P-type ZnO thin films achieved by N+ ion implantation through dynamic annealing process;Applied Physics Letters;2012-09-10

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