Strain measurements of SiGeC heteroepitaxial layers on Si(001) using ion beam analysis

Author:

Sego S.,Culbertson R. J.,Smith David J.,Atzmon Z.,Bair A. E.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Stress Analysis and Junction Leakage of Sub-Melt Laser Annealed SiGe Epitaxial Layers;IEEE Transactions on Semiconductor Manufacturing;2010-11

2. Characterization of Si(100)/HfSiON interface;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-06

3. Second-harmonic amplitude and phase spectroscopy by use of broad-bandwidth femtosecond pulses;Journal of the Optical Society of America B;2003-12-01

4. High-performance self-aligned SiGeC HBT with selectively grown Si/sub 1-x-yGe/sub x/C/sub y/ base by UHV/CVD;IEEE Transactions on Electron Devices;2003-11

5. Suppression of B Outdiffusion by C Incorporation in Ultra-High-Speed SiGeC HBTs;Japanese Journal of Applied Physics;2003-04-30

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