Low-temperature and scalable CVD route to WS2monolayers on SiO2/Si substrates-Reference-Cited by-同舟云学术

Low-temperature and scalable CVD route to WS2monolayers on SiO2/Si substrates

Published:2017-11 Issue:6 Volume:35 Page:061502
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Cadot Stéphane¹,Renault Olivier,Rouchon Denis,Mariolle Denis,Nolot Emmanuel,Thieuleux Chloé,Veyre Laurent,Okuno Hanako²,Martin François³,Quadrelli Elsje Alessandra⁴

Affiliation:

1. Université Grenoble Alpes, FR-38000 Grenoble; CEA LETI, Minatec Campus, 38054 Grenoble Cedex 9, France and Université de Lyon, laboratoire C2P2 - UMR 5265 (CNRS - Université Claude Bernard Lyon 1 - CPE Lyon), école supérieure de chimie, physique et électronique de Lyon, 43 Boulevard du 11 Novembre 1918, 69616 Villeurbanne Cedex, France

2. Université Grenoble Alpes, FR-38000 Grenoble; CEA INAC, MEM, Minatec Campus, 38054 Grenoble Cedex 9, France

3. Université Grenoble Alpes, FR-38000 Grenoble; CEA, LETI, Minatec Campus, 38054 Grenoble Cedex 9, France

4. Université de Lyon, laboratoire C2P2 - UMR 5265 (CNRS - Université Claude Bernard Lyon 1 - CPE Lyon), école supérieure de chimie, physique et électronique de Lyon, 43 Boulevard du 11 Novembre 1918, 69616 Villeurbanne Cedex, France

Funder

Commissariat à l'Énergie Atomique et aux Énergies Alternatives (CEA)

Centre National de la Recherche Scientifique (CNRS)

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4996550

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