Deposition of amorphous hydrogenated silicon carbide films using organosilanes in an argon/hydrogen plasma-Reference-Cited by-同舟云学术

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Deposition of amorphous hydrogenated silicon carbide films using organosilanes in an argon/hydrogen plasma

Published:1994-05 Issue:3 Volume:12 Page:754-759
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Maya Leon

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578819

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Selective effect of ion/surface interaction in low frequency PACVD of SIC:H films: Part B. Microstructural study;Surface and Coatings Technology;2006-09

2. Selective effect of ion/surface interaction in low frequency PACVD of SiC:H films: Part A. Gas phase considerations;Surface and Coatings Technology;2005-10

3. Electrical Measurements and Optical Emission Spectroscopy of Silicon–Carbon Alloys Grown by PACVD: Correlation with Film Microstructure;Chemical Vapor Deposition;2003-06-17

4. Low frequency PACVD of silicon-carbon alloys : Process study;Le Journal de Physique IV;2001-08

5. Ion bombardment and temperature effects on the microstructure of RF plasma chemical vapor-deposited SiC:H;Surface and Coatings Technology;2001-07

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