Nanoscale lift-off process using field emission scanning probe lithography-Reference-Cited by-同舟云学术

Nanoscale lift-off process using field emission scanning probe lithography

Published:2019-11 Issue:6 Volume:37 Page:061803
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Hofmann Martin¹,Mecholdt Stephan¹,Mohr Markus²,Holz Mathias³,Dallorto Stefano⁴^ORCID,Manske Eberhard⁵,Fecht Hans-Jörg²,Rangelow Ivo W.¹^ORCID

Affiliation:

1. Department of Micro- and Nanoelectronic Systems, TU Ilmenau, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany

2. Institute of Functional Nanosystems, Ulm University, Albert-Einstein-Allee 47, 89081 Ulm, Germany

3. Nanoanalytik GmbH, Ehrenbergstraße 1, 98693 Ilmenau, Germany

4. Lawrence Berkeley National Laboratory, Molecular Foundry, Berkeley, California 94720

5. Institute of Process Measurement and Sensor Technology, TU Ilmenau, Gustav-Kirchhoff-Str. 1, 98693 Ilmenau, Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5122272

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