New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell-Reference-Cited by-同舟云学术

New insights on the chemistry of plasma-enhanced atomic layer deposition of indium oxysulfide thin films and their use as buffer layers in Cu(In,Ga)Se2 thin film solar cell

Published:2018-11 Issue:6 Volume:36 Page:061510
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Bugot Cathy¹²,Bouttemy Muriel¹³,Schneider Nathanaelle¹⁴,Etcheberry Arnaud¹³,Lincot Daniel¹⁴,Donsanti Frédérique¹²

Affiliation:

1. Institut Photovoltaïque Ile de France (IPVF), 30 route départementale 128, 91120 Palaiseau, France

2. EDF R&D, 30 route départementale 128, 91120 Palaiseau, France

3. Institut Lavoisier de Versailles (ILV), Université de Versailles Saint-Quentin en Yvelines, Université Paris-Saclay CNRS, 45 avenue des Etats-Unis, 78035 Versailles, France

4. CNRS, Institut Photovoltaïque Ile de France (IPVF), UMR 9006, 30 route départementale 128, 91120 Palaiseau, France

Funder

French ministry of Higher Education and Research

Électricité de France

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5048124

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1. Crystalline Tin Disulfide by Low-Temperature Plasma-Enhanced Atomic Layer Deposition as an Electrode Material for Li-Ion Batteries and CO₂ Electroreduction;ACS Applied Energy Materials;2023-12-01

2. Sn_1–xGe_xO_y and Zn_1–xGe_xO_y by Atomic Layer Deposition─Growth Dynamics, Film Properties, and Compositional Tuning for Charge Selective Transport in (Ag,Cu)(In,Ga)Se₂ Solar Cells;ACS Applied Energy Materials;2023-09-22

3. Atomic layer deposition of conductive and semiconductive oxides;Applied Physics Reviews;2022-12

4. Simple thermal vapor deposition process for and characterization of n-type indium oxysulfide thin films;Journal of Vacuum Science & Technology A;2022-12

5. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching;Nanomaterials;2022-10-06