Negative resist behavior of obliquely deposited Ge–Sb–Se thin films-Reference-Cited by-同舟云学术

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Negative resist behavior of obliquely deposited Ge–Sb–Se thin films

Published:1987-05 Issue:3 Volume:5 Page:354-357
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kumar Ajay,Malhotra L. K.,Chopra K. L.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.574159

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-06-02

2. Chalcogenide glass resists for lithography;Chalcogenide Glasses;2014

3. Characteristics of Hydrogenation in Obliquely-Deposited Amorphous AsGeSeS Thin Films;Journal of the Korean Physical Society;2007-11-15

4. Photoinduced phase transformations in amorphous ZnSe thin films: amorphous-to-amorphous and amorphous-to-nanocrystalline transitions;Thin Solid Films;2003-09

5. Sub-0.1 µm Patterning Characteristics of Inorganic Thin Films by Focused-Ion-Beam Lithography;Japanese Journal of Applied Physics;1998-12-30

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