Focused ion beam induced Ga-contamination—An obstacle for UV-nanoimprint stamp repair?-Reference-Cited by-同舟云学术

Focused ion beam induced Ga-contamination—An obstacle for UV-nanoimprint stamp repair?

Published:2013-07 Issue:4 Volume:31 Page:041602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Waid Simon,Wanzenboeck Heinz D.,Gavagnin Marco,Langegger Ruppert,Muehlberger Michael,Bertagnolli Emmerich

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4813025

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