Titanium nitride prepared by plasma-based titanium-ion implantation-Reference-Cited by-同舟云学术

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Titanium nitride prepared by plasma-based titanium-ion implantation

Published:1999 Issue:2 Volume:17 Page:840
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Yukimura Ken,Sano Masanori,Maruyama Toshiro,Kurooka Shunji,Suzuki Yasuo,Chayahara Akiyoshi,Kinomura Atsushi,Horino Yuji

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High power diode laser nitriding of titanium in nitrogen gas filled simple acrylic box container: Microstructure, phase formation, hardness, dendrite and martensite solidification analyses;Materials Characterization;2020-02

2. Formation of DLC films by three-dimensional ion implantation under high vacuum;Electrical Engineering in Japan;2006

3. Formation of DLC Films by the Three-dimensional Ion Implantation under High Vacuum;IEEJ Transactions on Fundamentals and Materials;2005

4. Effect of plasma immersion ion implantation on the thermal stability of diffusion barrier layers;Surface and Coatings Technology;2004-08

5. Preparation and characterization of TiN coatings produced by combination of PI3D and ICP assisted magnetron PVD;Surface and Coatings Technology;2003-07

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