Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process-Reference-Cited by-同舟云学术

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Use of TRIDYN and medium energy ion scattering to calibrate an industrial arsenic plasma doping process

Published:2019-05 Issue:3 Volume:37 Page:031206
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

England Jonathan¹²^ORCID,Van den Berg Jaap³^ORCID,Rossall Andrew³

Affiliation:

1. Varian Semiconductor Equipment, Silicon Systems Group, Applied Materials Inc., 35 Dory Road, Gloucester, Massachusetts 01930

2. Surrey Ion Beam Centre, Advanced Technology Institute, University of Surrey, Guildford, Surrey GU2 7XH, UK

3. Ion Beam Centre, School of Computing and Engineering, University of Huddersfield, Huddersfield HD1 3DH, UK

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5088958

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inelastic collision effects of high-energy neutrons in tungsten materials;Journal of Nuclear Materials;2022-10

2. Complementary characterization method of 3D arsenic doping by using medium energy ion scattering;Journal of Physics Communications;2021-01-01

3. Profiling As plasma doped Si/SiO2 with molecular ions;Thin Solid Films;2019-12

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