Effect of deposition temperature on thermal stability in high-density plasma chemical vapor deposition fluorine-doped silicon dioxide-Reference-Cited by-同舟云学术

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Effect of deposition temperature on thermal stability in high-density plasma chemical vapor deposition fluorine-doped silicon dioxide

Published:2004 Issue:3 Volume:22 Page:494
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Cheng Y. L.,Wang Y. L.,Chen H. W.,Lan J. L.,Liu C. P.,Wu S. A.,Wu Y. L.,Lo K. Y.,Feng M. S.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical Characteristics and Reliability of SiCN/Porous SiOCH Stacked Dielectric: Effects of Deposition Temperature of SiCN Film;ECS Journal of Solid State Science and Technology;2021-12-01

2. Effects of Precursor Flow Rates on Characteristics of Low-K SiOC(H) Film Deposited by Plasma-Enhanced Chemical Vapor Deposition;ECS Transactions;2016-05-19

3. Low refractive index SiOF thin films prepared by reactive magnetron sputtering;Thin Solid Films;2013-09

4. Fabrication of SiO2 nano-dots by block copolymer lithography and liquid phase deposition;Materials Science and Engineering: B;2008-02

5. Fluorine content of SiOF films as determined by IR spectroscopy and resonant nuclear reaction analysis;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-05

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