Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes-Reference-Cited by-同舟云学术

Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes

Published:2020-09 Issue:5 Volume:38 Page:052602
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Basher Abdulrahman H.¹^ORCID,Krstić Marjan²^ORCID,Fink Karin³^ORCID,Ito Tomoko¹^ORCID,Karahashi Kazuhiro¹^ORCID,Wenzel Wolfgang²^ORCID,Hamaguchi Satoshi¹^ORCID

Affiliation:

1. Center for Atomic and Molecular Technologies, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

2. 3DMM2O—Cluster of Excellence (EXC-2082/1–390761711), Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

3. Institute of Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz-Platz 1, 76344 Eggenstein-Leopoldshafen, Germany

Funder

Japan Society for the Promotion of Science

Japan Society for the Promotion of ScienceCore-to-Core Program

Deutsche Forschungsgemeinschaft under German's Excellence Strategy

Deutsche Forschungsgemeinschaft

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000293

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