Maintaining atomically smooth GaAs surfaces after high-temperature processing for precise interdiffusion analysis and materials engineering-Reference-Cited by-同舟云学术

Maintaining atomically smooth GaAs surfaces after high-temperature processing for precise interdiffusion analysis and materials engineering

Published:2021-12 Issue:6 Volume:39 Page:062212
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Miroshnik Leonid¹^ORCID,Rummel Brian D.²^ORCID,Li Andrew B.³^ORCID,Balakrishnan Ganesh⁴^ORCID,Sinno Talid⁵^ORCID,Han Sang M.¹²⁴^ORCID

Affiliation:

1. Chemical and Biological Engineering, University of New Mexico, Albuquerque, New Mexico 87131

2. Nanoscience and Microsystems Engineering, University of New Mexico, Albuquerque, New Mexico 87131

3. Department of Physics and Astronomy, University of Pennsylvania, Philadelphia, Pennsylvania 19146

4. Center for High Technology Materials, University of New Mexico, Albuquerque, New Mexico 87106

5. Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19146

Funder

National Science Foundation

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

https://avs.scitation.org/doi/am-pdf/10.1116/6.0001399

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