Aspects of nitrogen surface chemistry relevant to TiN chemical vapor deposition-Reference-Cited by-同舟云学术

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Aspects of nitrogen surface chemistry relevant to TiN chemical vapor deposition

Published:1996-11 Issue:6 Volume:14 Page:3228-3235
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Schulberg Michelle T.,Allendorf Mark D.,Outka Duane A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580218

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reversible Tuning of the Surface Chemical Reactivity of Titanium Nitride and Nitride−Carbide Diffusion Barrier Thin Films;Chemistry of Materials;2009-10-07

2. Understanding the Reactivity of Oxide-Supported Bimetallic Clusters: Reaction of NO with CO on TiO2(110)-Supported Pt−Rh Clusters;The Journal of Physical Chemistry C;2007-01-18

3. Characteristics of ZrN Films Deposited by Remote PEALD Method Using TDEAZ Precursor;Korean Journal of Materials Research;2005-09-01

4. Characteristics and Compositional Variation of TiN Films Deposited by Remote PEALD on Contact Holes;Journal of The Electrochemical Society;2005

5. Influence of the ambient gas in laser structuring of the titanium surface;Surface and Coatings Technology;2004-10

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