Reversible Tuning of the Surface Chemical Reactivity of Titanium Nitride and Nitride−Carbide Diffusion Barrier Thin Films
Author:
Affiliation:
1. Departments of Chemistry and Biochemistry and of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm902107h
Reference60 articles.
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4. Deposition of TiN and TaN by Remote Plasma ALD for Cu and Li Diffusion Barrier Applications
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