Author:
Francone A.,Iojoiu C.,Poulain C.,Lombard C.,Pépin-Donat B.,Boussey J.,Zelsmann M.
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Cited by
12 articles.
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1. The role of hydrophobic silane coating on Si stamps in nanoimprint lithography;Journal of Applied Physics;2017-01-28
2. Effect of elastic modulus of UV cured resist on demolding force;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11
3. Joint optimization of condition-based maintenance and production lot-sizing;European Journal of Operational Research;2016-08
4. Nanostrukturierung;Nanotechnologie und Nanoprozesse;2016-05-13
5. Resist behaviour during peeling release in nano-imprint lithography;SPIE Proceedings;2016-05-10