Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers-Reference-Cited by-同舟云学术

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Influence of the film properties on the plasma etching dynamics of rf-sputtered indium zinc oxide layers

Published:2007-07 Issue:4 Volume:25 Page:659-665
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Stafford L.,Lim W. T.,Pearton S. J.,Chicoine M.,Gujrathi S.,Schiettekatte F.,Park Jae-Soung,Song Ju-Il,Heo Young-Woo,Lee Joon-Hyung,Kim Jeong-Joo,Kravchenko I. I.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2736679

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Etch Mechanism of AlN Thin Film in Cl2/Ar Inductively Coupled Plasma;Transactions on Electrical and Electronic Materials;2022-08-04

2. Ar/O2 and H2O plasma surface modification of SnO2 nanomaterials to increase surface oxidation;Sensors and Actuators B: Chemical;2015-03

3. Dry Etching Characteristics of Indium Zinc Oxide Thin Films in Adaptive Coupled Plasma;Transactions on Electrical and Electronic Materials;2013-08-25

4. High quality amorphous indium zinc oxide thin films synthesized by pulsed laser deposition;Thin Solid Films;2011-12

5. Phase Development and Electrical Characteristics of n-Type Semiconductive Transparent In₂O₃(ZnO)₂ Ceramics with ZnO/SnO₂ Co-Substitution;Journal of Nanoelectronics and Optoelectronics;2010-08-01

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