X-ray mask distortion analysis using the boundary element method-Reference-Cited by-同舟云学术

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X-ray mask distortion analysis using the boundary element method

Published:1990-05 Issue:3 Volume:8 Page:446
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Ohki Shigehisa

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition and Characterization of Ta, TaNxand Ta4B Films for Next-Generation Lithography Mask Applications;Japanese Journal of Applied Physics;2000-12-30

2. Use of oxygen gas in diamond film growth for improving stress and crystallinity properties of an x-ray mask;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1998-05

3. An Ultralow StressTa4BAbsorber for X-Ray Masks;Japanese Journal of Applied Physics;1997-12-30

4. Recent progress in synchrotron radiation lithography;Journal of Electron Spectroscopy and Related Phenomena;1996-05

5. Investigation of the chemical mechanisms of Ta(110) /Ta(110)-suboxide etch selectivity using Cl2 molecular beams;Surface Science;1995-02

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