Reduction of ultraviolet-radiation damage in SiO[sub 2] using pulse-time-modulated plasma and its application to charge coupled 44 device image sensor processes-Reference-Cited by-同舟云学术

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Reduction of ultraviolet-radiation damage in SiO[sub 2] using pulse-time-modulated plasma and its application to charge coupled 44 device image sensor processes

Published:2003 Issue:6 Volume:21 Page:2448
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Okigawa Mitsuru,Ishikawa Yasushi,Samukawa Seiji

Publisher

American Vacuum Society

Subject

General Engineering

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