Pulsed ion beam surface analysis as a means of in situ real‐time analysis of thin films during growth-Reference-Cited by-同舟云学术

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Pulsed ion beam surface analysis as a means of in situ real‐time analysis of thin films during growth

Published:1994-07 Issue:4 Volume:12 Page:1943-1951
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Krauss A. R.,Lin Y.,Auciello O.,Lamich G. J.,Gruen D. M.,Schultz J. A.,Chang R. P. H.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578987

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pulsed Laser Deposition (PLD);Handbook of Crystal Growth;2015

2. Advanced synthesis techniques and routes to new single-phase multiferroics;Current Opinion in Solid State and Materials Science;2012-10

3. In situ ion beam surface characterization of thin multicomponent films;In Situ Characterization of Thin Film Growth;2011

4. Advances in the growth and characterization of magnetic, ferroelectric, and multiferroic oxide thin films;Materials Science and Engineering: R: Reports;2010-05

5. Quantitative analysis of ultra thin layer growth by time-of-flight low energy ion scattering;Applied Physics Letters;2008

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