Summary Abstract: Simultaneous exposure of SiO2 and ThF4 to XeF2 and energetic electrons
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Published:1985-09
Issue:5
Volume:3
Page:1393
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
10 articles.
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1. Charge-Enhanced Kinetics;Non-Classical Crystallization of Thin Films and Nanostructures in CVD and PVD Processes;2016
2. Kinetics of gas mediated electron beam induced etching;Applied Physics Letters;2011-11-21
3. Surface science aspects of etching reactions;Surface Science Reports;1992-01
4. Chemical treatment of fused silica with xenon difluoride;Applied Surface Science;1991-01
5. Excimer laser induced etching of InP;Applied Physics Letters;1990-08-13