Modification of copper and copper oxide surface states due to isopropyl alcohol treatment toward area-selective processes-Reference-Cited by-同舟云学术

Modification of copper and copper oxide surface states due to isopropyl alcohol treatment toward area-selective processes

Published:2021-01 Issue:1 Volume:39 Page:013403
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Mawaki Takezo¹,Teramoto Akinobu²,Ishii Katsutoshi³,Shiba Yoshinobu⁴,Kuroda Rihito¹,Suwa Tomoyuki⁴,Azumo Shuji³,Shimizu Akira³,Umezawa Kota³,Shirai Yasuyuki⁴,Sugawa Shigetoshi⁴

Affiliation:

1. Graduate School of Engineering, Tohoku University, 6-6-11 Aza-Aoba, Aramaki, Aoba-ku, Sendai, 980-8579, Japan

2. Hiroshima University, Research Institute for Nanodevice and Bio Systems, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-8527, Japan

3. Tokyo Electron Technology Solutions Ltd., 650 Mitsuzawa, Hosaka-cho, Nirasaki, Yamanashi 407-0192, Japan

4. New Industry Creation Hatchery Center, Tohoku University, 6-6-10 Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000618

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Self-aligned patterning of tantalum oxide on Cu/SiO2 through redox-coupled inherently selective atomic layer deposition;Nature Communications;2023-07-26

2. Imparting Electrical Conductivity in Epoxy Resins (Chemistry and Approaches);Engineering Materials;2023

3. Electron Beam-Induced Reduction of Cuprite;Metals;2022-12-15

4. Adsorption and surface reaction of isopropyl alcohol on SiO₂ surfaces;Journal of Vacuum Science & Technology A;2022-09