Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions-Reference-Cited by-同舟云学术

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Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions

Published:2021-01 Issue:1 Volume:39 Page:012407
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Chowdhury Md. Istiaque¹^ORCID,Sowa Mark²^ORCID,Kozen Alexander C.³^ORCID,Krick Brandon A.⁴⁵,Haik Jewel⁵,Babuska Tomas F.⁴,Strandwitz Nicholas C.¹

Affiliation:

1. Department of Materials Science and Engineering, Lehigh University, Bethlehem, Pennsylvania 18015

2. Veeco ALD, Waltham, Massachusetts 02453

3. Department of Materials Science and Engineering, University of Maryland, College Park, Maryland 20740

4. Mechanical Engineering, Florida State University, Tallahassee, Florida 32310

5. Department of Mechanical Engineering and Mechanics, Lehigh University, Bethlehem, Pennsylvania 18015

Funder

Division of Civil, Mechanical and Manufacturing Innovation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/6.0000717

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of deposition temperature on the wear behavior and material properties of plasma enhanced atomic layer deposition (PEALD) titanium vanadium nitride thin films;Wear;2023-06

2. Atomic layer deposition of MoOx thin films using Mo(iPrCp)2H2 and O3;Journal of Vacuum Science & Technology A;2023-04-26

3. Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor;Journal of Vacuum Science & Technology A;2023-01

4. Origin of Decomposition in a Family of Molybdenum Precursor Compounds;Inorganic Chemistry;2022-10-12

5. Thermal Stability and Decomposition Pathways in Volatile Molybdenum(VI) Bis-imides;Inorganic Chemistry;2022-03-15

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