Ultraviolet ozone oxidation of Si surface studied by photoemission and surface infrared spectroscopy-Reference-Cited by-同舟云学术

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Ultraviolet ozone oxidation of Si surface studied by photoemission and surface infrared spectroscopy

Published:1992-09 Issue:5 Volume:10 Page:3171-3175
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Niwano Michio,Suemitsu Maki,Ishibashi Yutaka,Takeda Yuki,Miyamoto Nobuo,Honma Koji

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577838

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