Dry etching of NiFe∕Co and NiFe∕Al–O∕Co multilayers in an inductively coupled plasma of Cl2∕Ar mixture-Reference-Cited by-同舟云学术

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Dry etching of NiFe∕Co and NiFe∕Al–O∕Co multilayers in an inductively coupled plasma of Cl2∕Ar mixture

Published:2004-11 Issue:6 Volume:22 Page:2388-2391
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ra H.-W.,Hahn Y. B.,Song K. S.,Park M. H.,Hong Y. K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1806441

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fine-line formation of cobalt thin films via cyclic etching using two-step process;Materials Science in Semiconductor Processing;2024-03

2. Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam;Journal of Vacuum Science & Technology A;2023-04-03

3. Thermodynamic assessment and experimental verification of reactive ion etching of magnetic metal elements;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-07

4. Large area nanorings fabricated using an atomic layer deposition Al2O3spacer for magnetic random access memory application;Nanotechnology;2008-05-19

5. Mass and Auger electron spectroscopy studies of the interactions of atomic and molecular chlorine on a plasma reactor wall;Journal of Applied Physics;2008-01

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