Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamber-Reference-Cited by-同舟云学术

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Plasma resistance of sintered and ion-plated yttrium oxyfluorides with various Y, O, and F composition ratios for use in plasma process chamber

Published:2020-07 Issue:4 Volume:38 Page:043003
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Goto Tetsuya¹^ORCID,Shiba Yoshinobu¹,Teramoto Akinobu¹²^ORCID,Kishi Yukio³,Sugawa Shigetoshi¹

Affiliation:

1. New Industry Creation Hatchery Center, Tohoku University, Sendai 980-8579, Japan

2. Research Institute for Nanodevice and Bio System, Hiroshima University, Higashihiroshima 739-8527, Japan

3. Nippon Yttrium Co., Ltd, Tosen, Omuta, Fukuoka 836-0003, Japan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5142515

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Correlated structural and optical properties of crystal-engineered Eu3+-doped gadolinium oxyfluoride polymorphs compatible for lighting and display applications;Ceramics International;2024-02

2. Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semiconductor manufacturing: A review;Materials Today Communications;2023-03

3. Effect of charge-up of surfaces of sintered Y₂O₃ and yttrium oxyfluoride on their erosion rates due to ion bombardment;Journal of Vacuum Science & Technology B;2022-12

4. The role of fluorination during the physicochemical erosion of yttria in fluorine-based etching plasmas;Journal of the European Ceramic Society;2022-02

5. Atomic layer deposition of hafnium and zirconium oxyfluoride thin films;Journal of Vacuum Science & Technology A;2021-03

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