Author:
Lee Young D.,Chang H. Y.,Chang C. S.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
2 articles.
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1. Atomic-scale silicon etching control using pulsed Cl2 plasma;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-01
2. Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-07