Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water-Reference-Cited by-同舟云学术

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Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water

Published:2014-05 Issue:3 Volume:32 Page:031513
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sperling Brent A.,Hoang John,Kimes William A.,Maslar James E.,Steffens Kristen L.,Nguyen Nhan V.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4872166

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A systematical investigation of layer growth rate, impurity level and morphology evolution in TiO2 thin films grown by ALD between 100 and 300 °C;Vacuum;2023-10

2. Small-Molecule Modification Provides Pt Nucleation Sites for Enhanced Propane Dehydrogenation Performance;The Journal of Physical Chemistry C;2023-03-16

3. Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO₂;Chemistry of Materials;2023-01-03

4. A theoretical study on the surface reaction of tetrakis(dimethylamino)titanium on titanium oxide;Physical Chemistry Chemical Physics;2023

5. Water-rich conditions during titania atomic layer deposition in the 100 °C-300 °C temperature window produce films with TiIV oxidation state but large H and O content variations;Applied Surface Science;2022-11

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