Influence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ions-Reference-Cited by-同舟云学术

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Influence of ion-to-atom ratio on the microstructure of evaporated molybdenum thin films grown using low energy argon ions

Published:2014-03 Issue:2 Volume:32 Page:021509
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Yadav Praveen Kumar,Sant Tushar,Mukherjee Chandrachur,Nayak Maheswar,Rai Sanjay Kumar,Lodha Gyanendra Singh,Sharma Surinder Mohan

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4862141

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions;Chemistry of Materials;2024-01-29

2. Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films;Plasma Processes and Polymers;2015-02-09

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