Cl[sub 2]∕O[sub 2]-inductively coupled plasma etching of deep hole-type photonic crystals in InP-Reference-Cited by-同舟云学术

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Cl[sub 2]∕O[sub 2]-inductively coupled plasma etching of deep hole-type photonic crystals in InP

Published:2006 Issue:1 Volume:24 Page:L6
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Carlström C. F.,van der Heijden R.,Karouta F.,van der Heijden R. W.,Salemink H. W. M.,van der Drift E.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 37 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Assessing neutral transport mechanisms in aspect ratio dependent etching by means of experiments and multiscale plasma modeling;Plasma Sources Science and Technology;2023-06-01

2. The Method of Low-Temperature ICP Etching of InP/InGaAsP Heterostructures in Cl2-Based Plasma for Integrated Optics Applications;Micromachines;2021-12-10

3. Low temperature ICP etching of InP/InGaAsP heterostructure in Cl2-based plasma;Journal of Physics: Conference Series;2019-11-01

4. Electrically pumped 15 μm InP-based quantum dot microring lasers directly grown on (001) Si;Optics Letters;2019-09-12

5. Evaluation of oxygen species during E–H transition in inductively coupled RF plasmas: combination of experimental results with global model;The European Physical Journal D;2018-05

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