Determination and application of the depth resolution function in sputter profiling with secondary ion mass spectroscopy and Auger electron spectroscopy
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.581239
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1. Effects of sputtering induced artifacts on the determination of diffusion coefficient: Application to Ni/Cu system;Vacuum;2022-08
2. Depth profiling of Cr-ITO dual-layer sample with secondary ion mass spectrometry using MeV ions in the low energy region;Scientific Reports;2022-07-08
3. Profiling with Depth Resolution of Sub-nm for SiO2/ SiC Interface by Dual-Beam TOF-SIMS Combined with Simulation;Materials Science Forum;2020-07
4. Explanation of the apparent depth resolution improvement by SIMS using cluster ion detection;Journal of Vacuum Science & Technology B;2020-05
5. Deconvolution method for obtaining directly the original in-depth distribution of composition from measured sputter depth profile;Vacuum;2019-08
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