Atomic layer deposition of bismuth oxide using Bi(OCMe2iPr)3 and H2O-Reference-Cited by-同舟云学术

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Atomic layer deposition of bismuth oxide using Bi(OCMe2iPr)3 and H2O

Published:2014-01 Issue:1 Volume:32 Page:01A113
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Austin Dustin Z.,Allman Derryl,Price David,Hose Sallie,Saly Mark,Conley John F.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4840835

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of structural and optical properties of europium ion activated bismuth oxide nanophosphors;Materials Today: Proceedings;2022

2. Room temperature chemical synthesis of Bi 2 O 3 nanoparticles;Micro & Nano Letters;2021-05-06

3. Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting;ACS Applied Nano Materials;2019-10-02

4. Atomic Layer Deposition of Bismuth Vanadate Core–Shell Nanowire Photoanodes;Chemistry of Materials;2019-05-01

5. Experimental investigations of the bismuth oxide film grown by atomic layer deposition using triphenyl bismuth;Thin Solid Films;2017-01

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