Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting-Reference-Cited by-同舟云学术

Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting

Published:2019-10-02 Issue:10 Volume:2 Page:6277-6286
ISSN:2574-0970
Container-title:ACS Applied Nano Materials
language:en
Short-container-title:ACS Appl. Nano Mater.

Author:

Müller Matthias J.¹²,Komander Kristina¹^ORCID,Höhn Christian¹,van de Krol Roel¹²^ORCID,Bronneberg Aafke C.¹

Affiliation:

1. Institute for Solar Fuels, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, Hahn-Meitner-Platz 1, 14109 Berlin, Germany

2. Institut für Chemie, Technische Universität Berlin, Straße des 17. Juni 124, 10623 Berlin, Germany

Funder

Bundesministerium f?r Bildung und Forschung

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

http://pubs.acs.org/doi/pdf/10.1021/acsanm.9b01261

Reference52 articles.

1. Comprehensive Evaluation of CuBi2O4 as a Photocathode Material for Photoelectrochemical Water Splitting

2. The Origin of Slow Carrier Transport in BiVO4 Thin Film Photoanodes: A Time-Resolved Microwave Conductivity Study

3. Photocatalytic generation of hydrogen by core-shell WO3/BiVO4 nanorods with ultimate water splitting efficiency

4. Atomic Layer Deposition of Bismuth Vanadates for Solar Energy Materials

5. Surface functionalized atomic layer deposition of bismuth vanadate for single-phase scheelite

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