High resolution electron beam lithography using a chemically amplified calix[4]arene based resist
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing;Photonics Research;2023-02-27
2. Nanofabrication by electron beam lithography and its applications: A review;Microelectronic Engineering;2015-03
3. Comparison of positive tone versus negative tone resist pattern collapse behavior;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11
4. Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008-11
5. Epoxide functionalized molecular resists for high resolution electron-beam lithography;Microelectronic Engineering;2008-05
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