X-ray lithography using broadband sources
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Published:1988-01
Issue:1
Volume:6
Page:186
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
3 articles.
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1. Imaging dissolution rate monitor: Mapping the photoresist response;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11
2. Modeling X-ray proximity lithography;IBM Journal of Research and Development;1993-05
3. X-ray microlithography with a transition radiation source;Microelectronic Engineering;1991-03