Author:
Choe Jae Y.,Herman Irving P.,Donnelly Vincent M.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
28 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Plasma etching: Yesterday, today, and tomorrow;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-09
2. Atomic-scale silicon etching control using pulsed Cl2 plasma;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-01
3. Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-03
4. Critical review: Plasma-surface reactions and the spinning wall method;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2011-01
5. Effects of impedance matching network on the discharge mode transitions in a radio-frequency inductively coupled plasma;Physics of Plasmas;2008-06