Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources
Author:
Affiliation:
1. Department of Chemical and Biological Engineering, Colorado School of Mines, Golden, Colorado 80401
2. Lam Research Corporation, 11155 SW Leveton Drive, Tualatin, Oregon 97062
Funder
Lam Research Corporation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5122994
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3. Extending growth inhibition during area-selective atomic layer deposition of Al2O3 on aminosilane-functionalized SiO2;Chemical Communications;2022
4. Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silicon without deposition on copper: The role of precursor;Vacuum;2022-01
5. Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface;Journal of Vacuum Science & Technology A;2022-01
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