Growth and characterization of plasma-assisted molecular beam epitaxial-grown AlGaN/GaN heterostructures on free-standing hydride vapor phase epitaxy GaN substrates
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Homo-epitaxial growth of high crystal quality GaN thin films by plasma assisted–molecular beam epitaxy;Journal of Crystal Growth;2019-01
2. AlN/GaN/AlN resonant tunneling diodes grown by rf-plasma assisted molecular beam epitaxy on freestanding GaN;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-03
3. Surface preparation of freestanding GaN substrates for homoepitaxial GaN growth by rf-plasma MBE;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-03
4. Critical issues for homoepitaxial GaN growth by molecular beam epitaxy on hydride vapor-phase epitaxy-grown GaN substrates;Journal of Crystal Growth;2016-12
5. Effect of interfacial oxygen on the microstructure of MBE-grown homoepitaxial N-polar GaN;Journal of Crystal Growth;2015-01
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