Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation-Reference-Cited by-同舟云学术

Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation

Published:2020-12 Issue:6 Volume:38 Page:062402
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Chopra Sonali N.¹²^ORCID,Vos Martijn F. J.¹^ORCID,Verheijen Marcel A.¹³^ORCID,Ekerdt John G.²^ORCID,Kessels Wilhelmus M. M.¹^ORCID,Mackus Adriaan J. M.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. McKetta Department of Chemical Engineering, The University of Texas at Austin, 200 East Dean Keeton Street, Stop C0400, Austin, Texas 78712

3. Eurofins Materials Science, High Tech Campus 11, 5656 AE Eindhoven, The Netherlands

Funder

Netherlands organization for scientific research

NASCENT Whaley fellowship

National Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/6.0000434

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