In operando x-ray photoelectron spectroscopy study of mechanism of atomic layer etching of cobalt
Author:
Affiliation:
1. Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716
Funder
National Science Foundation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5138989
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3. Fine-line formation of cobalt thin films via cyclic etching using two-step process;Materials Science in Semiconductor Processing;2024-03
4. Thermal Atomic Layer Etching of Molybdenum Using Sequential Oxidation and Deoxychlorination Reactions;Chemistry of Materials;2024-01-29
5. Thermal atomic layer etching of CoO using acetylacetone and ozone: Evidence for changes in oxidation state and crystal structure during sequential exposures;Applied Surface Science;2023-11
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