Spectra characterization of silicon carbonitride thin films by reactive radio frequency sputtering-Reference-Cited by-同舟云学术

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Spectra characterization of silicon carbonitride thin films by reactive radio frequency sputtering

Published:2002 Issue:1 Volume:20 Page:159
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Peng Xiaofeng,Song Lixin,Le Jun,Hu Xingfang

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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